Method for optimizing a spectacle lens for the wavefront aberrations of an eye and lens

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United States of America Patent

PATENT NO 8205987
APP PUB NO 20110255052A1
SERIAL NO

12763716

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The current invention is directed to a method for designing an ophthalmic lens element, the method comprising the steps of determining a wavefront aberration of an eye in a reference plane, wherein the wavefront aberration of the eye can be described by a first series of polynomials of ascending order up to a first specific order and corresponding first coefficients; determining a first vision correction of a second specific order; determining at least one specific point over an aperture of the adapted ophthalmic lens element; determining a high-order wavefront aberration in the reference plane for each specified point of the adapted ophthalmic lens element, wherein the high-order wavefront aberration can be described by a third series of polynomials of ascending order above the second specific order up to and including the first specific order and corresponding third coefficients; and determining a second vision correction of the second specific order.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS VISION INC12121 SCRIPPS SUMMIT DRIVE SUITE 400 SAN DIEGO CA 92131

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guillén, Jesús Miguel Cabeza Aalen, DE 1 14
Kelch, Gerhard Aalen, DE 29 210
Kratzer, Timo Aalen, DE 43 402
Meister, Darryl Olathe, US 3 59
Spratt, Ray Steven Petaluma, US 44 470
Welscher, Markus Aalen, DE 9 65
Wietschorke, Helmut Aalen, DE 43 437

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