Vacuum treatment installation for the production of a disk-shaped workpiece based on a dielectric substrate
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United States of America Patent
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Jun 26, 2012
Grant Date -
Jan 29, 2009
app pub date -
Sep 23, 2008
filing date -
Apr 30, 2004
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Abstract
A vacuum treatment installation has a vacuum receptacle with a first planar metallic electrode face, a second dielectric electrode face facing the first planar metallic electrode face which forms a surface of a dielectric areal configuration, a metallic coupling face facing a backside of the areal configuration, electric connections on the coupling and on the first electrode face, a gas line system through the coupling face and an areal distributed pattern of apertures through the areal configuration and wherein the areal dielectric configuration is formed by several ceramic tiles.
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