Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film

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United States of America Patent

PATENT NO 8202365
APP PUB NO 20090152506A1
SERIAL NO

12337072

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Abstract

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In a process for producing an oriented inorganic crystalline film, a non-monocrystalline film containing inorganic crystalline particles is formed on a substrate by a liquid phase technique using a raw-material solution which contains a raw material and an organic solvent, where the inorganic crystalline particles have a layered crystal structure and are contained in the raw material. Then, the non-monocrystalline film is crystallized by heating the non-monocrystalline film to a temperature equal to or higher than the crystallization temperature of the non-monocrystalline film so that part of the inorganic crystalline particles act as crystal nuclei.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Higashi, Kohei Kanagawa-ken, JP 30 4598
Hirai, Hiroyuki Kanagawa-ken, JP 151 5793
Kohda, Katsuhiro Kanagawa-ken, JP 61 4787
Sunagawa, Hiroshi Kanagawa-ken, JP 61 5487
Tanaka, Atsushi Kanagawa-ken, JP 574 12836
Umeda, Kenichi Kanagawa-ken, JP 28 5501

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