Gas management system for a laser-produced-plasma EUV light source
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United States of America Patent
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Jun 12, 2012
Grant Date -
Jun 10, 2010
app pub date -
Feb 2, 2010
filing date -
Aug 31, 2007
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Abstract
Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
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