Method for manufacturing patterned thin-film layer
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United States of America Patent
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Jun 12, 2012
Grant Date -
Oct 15, 2009
app pub date -
Apr 11, 2009
filing date -
Apr 11, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for manufacturing a patterned thin-film layer includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces; providing an ink-jet device comprising a plurality of nozzles for depositing ink therefrom; generating a jetting information about ink volume that each of the nozzles deposits into the respective spaces by a random method, the jetting information meeting ink volume deposited into each of the spaces is in a range from about 92.5% to about 107.5% of an average volume of ink in the spaces; making the nozzles to deposit ink into the respective spaces according to the jetting information; and solidifying the ink so as to form a plurality of patterned thin-film layers formed in the spaces.
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