Massively parallel lithography with two-dimensional pen arrays
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United States of America Patent
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Jun 5, 2012
Grant Date -
Dec 31, 2009
app pub date -
Dec 12, 2007
filing date -
Apr 19, 2006
priority date (Note) -
Expired
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Abstract
Massive parallel printing of structures and nanostructures, including lipids, at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The invention provides a nanolithographic method comprising (1) providing a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers extending from the base row, wherein each of the cantilevers comprising tips at the cantilever end away from the base row; wherein the two dimensional array has a support; (2) providing a patterning composition, wherein the composition comprises one or more lipids; (3) providing a substrate; (4) coating the tips of the cantilevers with the patterning composition; and (5) depositing at least some of the patterning composition from the tips to the substrate surface.
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