Polymer for resist and resist composition manufactured using the same

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United States of America Patent

PATENT NO 8187790
APP PUB NO 20100081079A1
SERIAL NO

12416973

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Abstract

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Disclosed are a polymer for a chemically amplified resist represented as

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Patent Owner(s)

Patent OwnerAddress
KOREA KUMHO PETROCHEMICAL CO LTD100 CHEONGGYECHEON-RO JUNG-GU SEOUL 04542

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hong, Yonghwa Cheonan-si, KR 4 4
Joo, Hyunsang Daejeon, KR 5 10
Kim, Jinho Daejeon, KR 374 3262
Lee, Changsoo Seoul, KR 51 169

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