Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
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United States of America Patent
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May 8, 2012
Grant Date -
Jan 28, 2010
app pub date -
Jul 5, 2005
filing date -
Jul 5, 2004
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Abstract
Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.
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