Solvent-free photocurable resin composition for protective film
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United States of America Patent
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May 1, 2012
Grant Date -
Jun 26, 2008
app pub date -
Aug 1, 2005
filing date -
Aug 10, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A solvent-free photocurable resin composition is provided which can be applied to the surface of optical discs or the like to form a highly transparent protective film that can stably adhere to the surface and effectively protect the surface from scratches. The solvent-free photocurable resin composition contains a urethane(meth)acrylate oligomer, a trifunctional (meth)acrylic acid ester monomer, a photopolymerization initiator, and a dilution monomer. The dilution monomer contains a fluorine-based (meth)acrylic acid ester monomer having three or more fluorine atoms and a monofunctional or difunctional (meth)acrylic acid ester monomer in amounts of from 10 to 40 wt% and from 10 to 30 wt%, respectively.
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