Powder metallurgy sputtering targets and methods of producing same
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United States of America Patent
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May 1, 2012
Grant Date -
Dec 31, 2009
app pub date -
Sep 2, 2009
filing date -
Jan 7, 2003
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Abstract
A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.
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