Substrate surface modifications for compositional gradation of crystalline materials and associated products
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United States of America Patent
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Apr 17, 2012
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N/A
app pub date -
May 31, 2007
filing date -
Feb 7, 2007
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Abstract
A compositionally graded material having low defect densities and improved electronic properties is disclosed and described. A compositionally graded inorganic crystalline material can be formed by preparing a crystalline substrate by forming crystallographically oriented pits across an exposed surface of the substrate. A transition region can be deposited on the substrate under substantially epitaxial growth conditions. Single crystal substrates of a wide variety of materials such as diamond, aluminum nitride, silicon carbide, etc. can be formed having relatively low defect rates.
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