CVD coating device
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United States of America Patent
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Apr 10, 2012
Grant Date -
Jun 1, 2006
app pub date -
Nov 22, 2005
filing date -
May 22, 2003
priority date (Note) -
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Abstract
The invention relates to a method for depositing especially crystalline layers on one or more, especially crystalline substrates in a process chamber by means of reaction gases that are introduced into the process chamber and that undergo especially pyrolitic reactions. The device comprises a support plate, heated from one side, on which at least one compensation plate rests while forming a horizontal gap. In order to be better able to influence the surface temperature, the gap height of the horizontal gap can be varied or is locally variable in order to influence the local surface temperature of the compensation plate.
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