Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 3, 2012
Grant Date -
Feb 5, 2009
app pub date -
Jul 21, 2008
filing date -
Aug 3, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for determining the lateral correction as a function of the substrate topology and/or the geometry of the substrate holder is disclosed. The substrate is placed on a measuring stage traversable in the X coordinate direction and Y coordinate direction, which carries the substrate to be measured. The substrate is supported on at least three support points which define a plane. An apparatus is provided for determining the position of a plurality of positions on the surface of the substrate in the in the X, Y and Z coordinate directions. The substrate is tiltable about an axis parallel to the X/Y plane, to enable the substrate to be measured in a tilted position.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully