Thin film coating system and method
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United States of America Patent
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Mar 13, 2012
Grant Date -
Jun 11, 2009
app pub date -
Oct 27, 2008
filing date -
Jun 5, 2007
priority date (Note) -
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Abstract
A method and system for depositing a thin film on a substrate. In the system a target material is deposited and reacted on a substrate surface to form a substantially non-absorbing thin film. The volume of non-absorbing thin film formed per unit of time may be increased by increasing the area of the surface by a factor of “x” and increasing the rate of deposition of the target material by a factor greater than the inverse of the factor “x” to thereby increase the rate of formation of the volume of non-absorbing thin film per unit of time.
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