Method of preventing generation of arc during rapid annealing by joule heating
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United States of America Patent
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Feb 28, 2012
Grant Date -
Sep 16, 2010
app pub date -
Jan 10, 2007
filing date -
Jun 9, 2006
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Abstract
Disclosed herein is a rapid annealing method in a mixed structure composed of a heat treatment-requiring material, dielectric layer and conductive layer, comprising that during rapid annealing on a predetermined part of the heat treatment-requiring material, by instantaneously generated intense heat due to Joule heating by application of an electric field to the conductive layer, the potential difference between the heat treatment-requiring material and the conductive layer is set lower than the dielectric break-down voltage of the dielectric layer, thereby preventing generation of arc by dielectric breakdown of the dielectric layer during the annealing.
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