Photosensitive molecular compound and photoresist composition including the same
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United States of America Patent
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Feb 28, 2012
Grant Date -
Aug 6, 2009
app pub date -
Jan 29, 2009
filing date -
Jan 30, 2008
priority date (Note) -
Expired
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Abstract
Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula.
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