Plasma reactor having multiple antenna structure
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United States of America Patent
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Feb 28, 2012
Grant Date -
Sep 4, 2008
app pub date -
Jul 6, 2006
filing date -
Jul 19, 2005
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Abstract
A plasma reactor includes a chamber in which a wafer is treated by a plasma reaction, the chamber being provided at an upper portion with a cylindrical dielectric window, a multiple antenna structure disposed on upper and lower portions of the dielectric window to generate RF magnetic field and apply the RF magnetic field inside the chamber through the dielectric window, thereby generating RF electric field, and an RF electric power supply unit for allowing for a time variation of the magnetic field of the multiple antenna structure.
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