Isolation structure and formation method thereof
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United States of America Patent
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Feb 21, 2012
Grant Date -
Nov 25, 2010
app pub date -
May 22, 2009
filing date -
May 22, 2009
priority date (Note) -
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Abstract
An isolation structure comprising a substrate is provided. A trench is in the substrate. A sidewall of the trench has a first inclined surface and a second inclined surface. The first inclined surface is located on the second inclined surface. The slope of the first inclined surface is different from the slope of the second inclined surface. A length of the first inclined surface is greater than 15 nanometers.
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