Ferroelectric memory device and method for manufacturing the same

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United States of America Patent

PATENT NO 8120082
APP PUB NO 20080105864A1
SERIAL NO

11721599

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Abstract

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made of an organic material such as PVDF, etc. shows polarization characteristics at low voltage below 1V, and such polarization characteristics continue over a specific time period, not changed as time goes by.Accordingly, it is possible to manufacture a ferroelectric memory device that operates at low voltage and is manufactured with a simplified structure in a simplified method.

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Patent Owner(s)

Patent OwnerAddress
UNIVERSITY OF SEOUL FOUNDATION OF INDUSTRY - ACADEMIC CORPORATIONUNIVERSITY OF SEOUL 90 JEONNONG-DONG DONGDAEMUN-GU SEOUL 130-743

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Park, Byung-Eun Seoul, KR 8 25

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