Infrared reflecting layer system for transparent substrate

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United States of America Patent

PATENT NO 8119194
APP PUB NO 20080032157A1
SERIAL NO

11749900

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Abstract

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An infrared radiation reflecting transparent layer system on a transparent substrate and a method for producing same is provided. The infrared radiation reflecting layer system comprises an infrared radiation reflecting layer sequence which includes a selective function usually consisting of a noble metal, mostly silver, or an alloy thereof and having a good selective reflectivity in the infrared range. The layer sequence is supplemented by at least one transparent dielectric layer of an oxynitride of a metal, a semiconductor or a semiconductor alloy having a low to moderate refractive index arranged directly on the substrate or above the infrared radiation reflecting layer sequence.

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Patent Owner(s)

Patent OwnerAddress
VON ARDENNE ANLAGENTECHNIK GMBHPLATTLEITE 19/29 DRESDEN 01324

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Koekert, Christoph Radebeul, DE 1 26
Milde, Falk Dresden, DE 13 120
Proehl, Holger Dresden, DE 7 40

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