Chemical vapor deposition process using novel precursors
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United States of America Patent
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Feb 21, 2012
Grant Date -
Jun 16, 2005
app pub date -
Dec 15, 2003
filing date -
Dec 15, 2003
priority date (Note) -
Expired
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Abstract
In a chemical vapor deposition process simple precursors such as a rare earth nitrate or acetate, Ba-nitrate or acetate and Cu-nitrate or acetate are dissolved in an appropriate solvent, preferably water, to form a solution, nebulized into a fine mist and applied to a substrate.
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