Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures
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United States of America Patent
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Jan 24, 2012
Grant Date -
Aug 28, 2008
app pub date -
Jan 15, 2008
filing date -
Feb 22, 2007
priority date (Note) -
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Abstract
An apparatus (1) for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer resulting from the structures (3) on the mask (2) is disclosed, wherein the apparatus (1) comprises at least one incident-light illumination means (14) and/or one transmitted-light illumination means (6), wherein the apparatus (1) comprises at least one imaging optics (9) and a detector (11) of a camera (10) for imaging the structures (3) on the mask (2), wherein a first computer program (17) is associated with the detector (11) of the camera (10) and provided for determining the position and/or the dimension of the structure (3) on the mask (2). A method for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer to be expected from the structures (3) on the mask (2) is also disclosed.
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