Method and system for performing materials analysis with reflected inelastic scatter
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United States of America Patent
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Jan 10, 2012
Grant Date -
Apr 7, 2011
app pub date -
Oct 2, 2009
filing date -
Oct 2, 2009
priority date (Note) -
Expired
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Abstract
A method for performing materials analysis of an object using an X-ray system includes generating an X-ray beam using an X-ray source having an anode and acquiring a scatter spectrum from Compton scatter produced when the X-ray beam interacts with the object. The scatter spectrum is acquired using an energy resolving detector. A Compton profile is extracted from the scatter spectrum by processing the scatter spectrum using a control system of the X-ray system. The Compton profile includes peaks at characteristic lines of the anode. The method further includes identifying a characteristic of a material of the object using the Compton profile, and outputting an indication of the characteristic of the material.
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