Method for X-ray wavelength measurement and X-ray wavelength measurement apparatus

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United States of America Patent

PATENT NO 8085900
APP PUB NO 20100111254A1
SERIAL NO

12645016

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A Method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus capable of determining absolute wavelength easily and carrying out wavelength measurement having high precision with a simple structure are provided. The present invention is a Method for X-ray wavelength measurement carried out by using a channel-cut crystal for wavelength measurement (20) in which two opposing cut planes are formed and the lattice constant of which is known, and the method diffracts X-ray in respective arrangements (-, +) and (+, -) of the channel-cut crystal for wavelength measurement (20), to determine the absolute wavelength of the X-ray from the difference between crystal rotation angles in respective arrangements. This makes the alignment simpler, and, when only a channel-cut crystal suitable for measurement can be prepared, X-ray wavelength measurement can be carried out easily and with high precision.

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Patent Owner(s)

  • RIGAKU CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Omote, Kazuhiko Akishima, JP 55 578

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