Polishing apparatus and polishing method
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United States of America Patent
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-
Dec 13, 2011
Grant Date -
Apr 30, 2009
app pub date -
Oct 29, 2008
filing date -
Oct 31, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus polishes an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser.
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