Method for removing residues formed during the manufacture of MEMS devices
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United States of America Patent
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Dec 6, 2011
Grant Date -
Jun 14, 2007
app pub date -
Jul 17, 2006
filing date -
Jul 18, 2005
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Abstract
A method of removing residues from an integrated device, in particular residues resulting from processing in HF vapor, is disclosed wherein the fabricated device is exposed to dry water vapor for a period of time sufficient to dissolve the residues in the dry water vapor.
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