Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 22, 2011
Grant Date -
Feb 25, 2010
app pub date -
Oct 29, 2008
filing date -
Oct 29, 2007
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully