Enhancing the image contrast of a high resolution exposure tool
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United States of America Patent
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Nov 8, 2011
Grant Date -
May 22, 2008
app pub date -
Nov 22, 2006
filing date -
Nov 22, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A system and method are utilized to equalize intensity or energy in various diffraction order portions of a patterned beam. The patterned beam is formed using a diffractive patterning device. An attenuator is placed at a pupil of a projection system to attenuate respective diffraction order portions of the patterned beam. The projection device is also used to project the patterned beam onto a target portion of a substrate, after the respective attenuations.
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