Structural modification using electron beam activated chemical etch
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 8, 2011
Grant Date -
Jul 12, 2007
app pub date -
Jan 12, 2007
filing date -
Jan 12, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Structural modification using electron beam activated chemical etch (EBACE) is disclosed. A target or portion thereof may be exposed to a gas composition of a type that etches the target when the gas composition and/or target are exposed to an electron beam. By directing an electron beam toward the target in the vicinity of the gas composition, an interaction between the electron beam and the gas composition etches a portion of the target exposed to both the gas composition and the electron beam. Structural modifications of the target may be conducted by means of etching due to interaction between the electron beam and gas composition.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully