Method for manufacturing patterned thin-film layer
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United States of America Patent
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Nov 1, 2011
Grant Date -
Oct 23, 2008
app pub date -
Dec 18, 2007
filing date -
Apr 20, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for manufacturing a patterned thin-film layer according to one preferred embodiment includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces therein for receiving ink therein, each of the banks having a top surface and a plurality of side surfaces adjacent to the top surface; irradiating the plurality of banks with UV light beams, wherein the UV light beams are obliquely incident on the top surfaces of the substrate such that a surface wettability of the ink on the top surfaces is lower than that of the side surfaces of the banks; applying ink into the spaces; and curing the ink so as to form a patterned thin-film layer on the substrate.
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