Compositions for cleaning ion implanted photoresist in front end of line applications
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United States of America Patent
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Oct 25, 2011
Grant Date -
Jul 17, 2008
app pub date -
Mar 13, 2006
filing date -
Apr 4, 2005
priority date (Note) -
Expired
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Abstract
A front end of the line (FEOL) stripping and cleaning composition for cleaning unashed ion-implanted photoresist from a wafer substrate comprises: a) at least one organic stripping solvent, b) fluoride ions from at least one of ammonium fluoride, ammonium bifluoride or hydrogen fluoride, c) at least one acidifying agent selected from inorganic or organic acids, and d) water, with an oxidizing agent optionally also being present in the composition.
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