Cleaning liquid and cleaning method for electronic material
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United States of America Patent
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Oct 25, 2011
Grant Date -
Jul 3, 2008
app pub date -
Dec 19, 2007
filing date -
Dec 27, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.
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