Non-planar sputter targets having crystallographic orientations promoting uniform deposition
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United States of America Patent
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Oct 18, 2011
Grant Date -
Sep 24, 2009
app pub date -
May 29, 2009
filing date -
Sep 13, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A non-planar sputter target having differing crystallographic orientations in portions of the sputter target surface that promote more desirable deposition and density patterns of material sputtered from the target surface onto a substrate. A closed dome end of the sputter target is comprised of a first crystallographic orientation and sidewalls of the sputter target are comprised of a crystallographic orientation different from that of the dome. The sputter target is formed, preferably by hydroforming or other metal working techniques, in the absence of annealing. The hydroforming manipulations result in the different crystallographic orientations while minimizing, or ideally omitting, the application of heat. Quick and cost effective non-planar sputter targets that are easily repeatably producable are achievable as a result.
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