Stationary x-ray target and methods for manufacturing same
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United States of America Patent
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Oct 11, 2011
Grant Date -
Feb 18, 2010
app pub date -
Aug 14, 2008
filing date -
Aug 14, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Stationary x-ray target assemblies manufactured using a metal deposition process to form one or more metal layers of the target. In particular, the metal deposition process is used to form an x-ray target metal layer and/or a stress buffer zone on an x-ray target substrate. The stress buffer zone improves material properties of the metals and/or the bonding between the x-ray target metal layer and the substrate. Improved bonding between the x-ray target metal layer and the substrate also improves the heat dissipation properties of the stationary x-ray target assembly.
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