Laser produced plasma EUV light source
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United States of America Patent
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Oct 11, 2011
Grant Date -
May 27, 2010
app pub date -
Jan 11, 2010
filing date -
Apr 8, 2003
priority date (Note) -
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Abstract
A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
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