Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film

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Oct 4, 2011
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May 21, 2009
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Jul 3, 2006
filing date
Jul 27, 2005

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Abstract

powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of SiαTiβOγ wherein α, β and γ are mole ratios of Si, Ti and O, respectively, and the ratio of α/β ranges from 0.45 to 7.25 and the ratio of γ/(α+β) ranges from 0.80 to 1.70.

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Patent Owner(s)

OSAKA TITANIUM TECHNOLOGIES CO., LTD.;ROHM CO., LTD.

International Classification(s)

C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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Inventor Name	Address	# of filed Patents	Total Citations
Azuma, Kazuomi	Amagasaki, JP	10	66
Kido, Jyunji	Yonezawa, JP	1	0
Mori, Koichi	Fujisawa, JP	116	899
Natsume, Yoshitake	Amagasaki, JP	7	72
Ogasawara, Tadashi	Amagasaki, JP	46	420

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Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11996550

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PATENT NO	8029655
APP PUB NO	20090127108A1
SERIAL NO	11996550
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
October 04, 2011	US,8029655,B2 US8029655B2	GRANTED PATENT AS SECOND PUBLICATION
May 21, 2009	US,20090127108,A1 US20090127108A1	FIRST PUBLISHED PATENT APPLICATION

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