Developing apparatus and developing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8021062
APP PUB NO 20100216077A1
SERIAL NO

12774006

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Abstract

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A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kitano, Takahiro Koshi, JP 154 1801
Nishi, Takanori Koshi, JP 40 565
Okumura, Katsuya Tokyo, JP 337 7835

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