Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 8014881
APP PUB NO 20080200998A1
SERIAL NO

11706422

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Abstract

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In a lithographic apparatus, a feedforward transfer function of a control system is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baggen, Constant Paul Marie Jozef Venlo-Blerick, NL 53 878
Baggen, Mark Constant Johannes Eindhoven, NL 13 38
Heertjes, Marcel François Best, NL 13 26
Houben, Dennis Andreas Petrus Hubertina Maastricht, NL 4 13
Kamidi, Ramidin Izair Eindhoven, NL 14 106
Tso, Yin Tim Eindhoven, NL 6 77
Van, De Molengraft Marinus Jacobus Gerardus Eindhoven, NL 4 9
Van, Den Biggelaar Petrus Marinus Christianus Maria Nuenen, NL 8 283

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