Photoresist systems
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United States of America Patent
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Sep 6, 2011
Grant Date -
Feb 12, 2004
app pub date -
Apr 11, 2003
filing date -
Apr 11, 2002
priority date (Note) -
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Abstract
New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
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