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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
HOKKO CHEMICAL INDUSTRY CO LTD	CHUO-KU TOKYO 103-8341

International Classification(s)

• C07F:ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CO....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Bannou, Tadashi	Okayama, JP	3	1
Hayakawa, Yoshiki	Tokyo, JP	14	47
Masaoka, Shin	Kanagawa, JP	7	17

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 30, 2011	US,8008521,B2   US8008521B2	GRANTED PATENT AS SECOND PUBLICATION
March 26, 2009	US,20090082585,A1   US20090082585A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8008521

Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes

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