Semiconductor process residue removal composition and process
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United States of America Patent
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Aug 23, 2011
Grant Date -
Aug 13, 2009
app pub date -
Mar 13, 2009
filing date -
Jun 6, 2002
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Abstract
A composition that includes 2-(2-aminoethylamino)-ethanol, at least one of a chelating agent and a corrosion inhibitor, and water. The composition is capable of removing organic, organometallic and metal oxide residues from semiconductor substrates. The invention also relates to a method of removing etching residue from a semiconductor substrate.
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