System and method for holographic lithographic production of a photonic crystal
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United States of America Patent
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Aug 23, 2011
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N/A
app pub date -
Oct 17, 2007
filing date -
Oct 17, 2007
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Expired
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Abstract
A system and method for holographic lithography is disclosed, including interferometeric alignment of laser sources. This includes creation of the volumetric holographic pattern around wire and other planar and non-planar substrates. This template is further processed into devices for various applications including Photonic Crystals, Photonic Band Gaps, Photonic Band Gaps with selective defects, and Photonic Band Gap incandescent emitters.
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