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Country	kind	publication No.	Filing Date	Type	Sub-Type
JP	B2	JP3688702	Nov 11, 2004	Patent	Grant
Type : Patent Sub-Type : Grant
PUBLISHED GRANTED PATENT (SECOND LEVEL)		RETROREFLECTION SHEET FOR SECURITY AND ITS MANUFACTURING METHOD		Aug 31, 2005
WO	A1	WO2005048217	Nov 12, 2004	Patent	Application
Type : Patent Sub-Type : Application
INTERNATIONAL APPLICATION PUBLISHED WITH INTERNATIONAL SEARCH REPORT		セキュリティ用再帰性反射シート及びその製造方法		May 26, 2005
AU	B2	AU2004290233	Nov 12, 2004	Patent	Grant
Type : Patent Sub-Type : Grant
PATENT PROCEEDED BY OPI		Retroreflective Sheet for Security and Method for Manufacturing the Same		Apr 10, 2008
TW	B	TWI341999	Nov 12, 2004	Patent	Grant
Type : Patent Sub-Type : Grant
GRANTED PATENT OR PATENT OF ADDITION		Retro-reflection sheet for security and process for producing the same		May 11, 2011
CN	C	CN100447589	Nov 12, 2004	Patent	Grant
Type : Patent Sub-Type : Grant
GRANTED PATENT FOR INVENTION		Retroreflection sheet for security and its manufacturing method		Dec 31, 2008
EP	B1	EP1646024	Nov 12, 2004	Patent	Grant
Type : Patent Sub-Type : Grant
Patent		RETROREFLECTIVE SHEET FOR SECURITY AND METHOD FOR MANUFACTURING THE SAME		Nov 07, 2012
KR	B1	KR100686999	Mar 09, 2006	Patent	Grant
Type : Patent Sub-Type : Grant
PATENT SPECIFICATION		RETROREFLECTION SHEET FOR SECURITY AND PROCESS FOR PRODUCING THE SAME		Feb 27, 2007

• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
KIWA CHEMICAL INDUSTRY CO LTD	WAKAYAMA-SHI WAKAYAMA 640-8254

International Classification(s)

• B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....

• 2004 Application Filing Year
• B32B Class
• 4030 Applications Filed
• 1652 Patents Issued To-Date
• 41 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Tanaka, Masanobu	Kinokawa, JP	104	939
# of filed Patents : 104 Total Citations : 939
Yukawa, Shigeo	Wakayama, JP	7	99
# of filed Patents : 7 Total Citations : 99

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Patent Citation Ranking

• 9 Citation Count
• B32B Class

• 5.58 % this patent is cited more than
• 14 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 23, 2011	US,8003197,B2   US8003197B2	GRANTED PATENT AS SECOND PUBLICATION
August 24, 2006	US,20060188700,A1   US20060188700A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 8003197

Retroreflective sheet for security and method for manufacturing the same

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Abstract

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is made of a composition containing a room temperature curing resin as a main component.

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Description

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Claims

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Claims data not available

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Legal Events

 

• MAFP2023
• MAFP2019
• FPAY2015
• FEPP2013
• I2011
• STCF2011
• P2006
• AS2005
• F2004
• PD2003

Date	Code	Event	Description
Feb 15, 2023	MAFP	MAINTENANCE FEE PAYMENT	free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY year of fee payment: 12
Feb 12, 2019	MAFP	MAINTENANCE FEE PAYMENT	free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY year of fee payment: 8
Feb 19, 2015	FPAY	FEE PAYMENT	year of fee payment: 4
Nov 02, 2013	FEPP	FEE PAYMENT PROCEDURE	free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY
Aug 23, 2011	I	Issuance
Aug 03, 2011	STCF	INFORMATION ON STATUS: PATENT GRANT	free format text: PATENTED CASE
Aug 24, 2006	P	Published
Nov 25, 2005	AS	ASSIGNMENT	free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:YUKAWA, SHIGEO;TANAKA, MASANOBU;REEL/FRAME:017487/0606 Owner name: KIWA CHEMICAL INDUSTRY CO., LTD., JAPAN Effective Date: Nov 25, 2005
Nov 12, 2004	F	Filing
Nov 14, 2003	PD	Priority Date