Plasma-based gas treatment system integrated in a vacuum pump
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United States of America Patent
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Aug 16, 2011
Grant Date -
Jun 30, 2005
app pub date -
Nov 30, 2004
filing date -
Dec 1, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A pumping system comprising at least one pump unit (2) with a vacuum pump casing in which there are multiple pumping stages that includes at least one pumped gas treatment system is provided. The pumped gas treatment system compromises at least one plasma source located inside the vacuum pump casing of the pump unit, to generate a plasma that at least partially decomposes certain gases passing through the pump unit. This reduces the size of the pumped gas treatment system and improves its efficiency so that a gas pumping and treatment system can be created that is sufficiently small as to allow it to be placed in close proximity to the process chambers.
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