Controlled electrochemical polishing method

United States of America Patent

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Aug 16, 2011
Grant Date
Dec 14, 2006
app pub date
Jun 13, 2005
filing date
Jun 13, 2005

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Expired

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Abstract

The invention relates to a method of polishing a substrate comprising at least one metal layer by applying an electrochemical potential between the substrate and at least one electrode in contact with a polishing composition comprising a reducing agent or an oxidizing agent.

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Patent Owner(s)

Patent Owner	Address
CABOT MICROELECTRONICS CORPORATION	870 NORTH COMMONS DRIVE AURORA IL 60504

International Classification(s)

C25F:PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIAL....

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Inventor Name	Address	# of filed Patents	Total Citations
Brusic, Vlasta	Geneva, US	23	414
Feeney, Paul M	Aurora, US	17	384

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Controlled electrochemical polishing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11150944

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PATENT NO	7998335
APP PUB NO	20060281196A1
SERIAL NO	11150944
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 16, 2011	US,7998335,B2 US7998335B2	GRANTED PATENT AS SECOND PUBLICATION
December 14, 2006	US,20060281196,A1 US20060281196A1	FIRST PUBLISHED PATENT APPLICATION

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11150944

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