Electroplating method

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United States of America Patent

PATENT NO 7998332
APP PUB NO 20090159452A1
SERIAL NO

12164429

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Abstract

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An electroplating method includes steps of: providing a substrate having a first portion and a second portion connected to the first portion; forming a metallic layer on a surface of the second portion; immersing the first portion of the substrate in an electrolyte solution, applying a current to the metallic layer to electroplate the first portion of the substrate with a metal layer; and moving the substrate in a direction away from the electrolyte solution during electroplating the first portion of the substrate. The method can improve a uniformity of the obtained plating layer.

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Patent Owner(s)

Patent OwnerAddress
ZHEN DING TECHNOLOGY CO LTDNO 6 LANE 28 SAN HO RD SAN SHI VILLAGE TAYUAN TAOYUAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bai, Yao-Wen Shenzhen, CN 19 61
Liou, Shing-Tza Taoyuan, TW 17 53
Zhang, Qiu-Yue Shenzhen, CN 6 10
Zhang, Rui Shenzhen, CN 806 5113

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