Method of alignment for efficient defect review
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United States of America Patent
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Aug 9, 2011
Grant Date -
Feb 21, 2008
app pub date -
Oct 12, 2007
filing date -
May 23, 2003
priority date (Note) -
Expired
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Abstract
An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.
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