Inductive plasma applicator
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United States of America Patent
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Aug 9, 2011
Grant Date -
Sep 30, 2010
app pub date -
Mar 27, 2009
filing date -
Mar 27, 2009
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An inductive plasma applicator comprises a ferromagnetic inductively coupled source and an electrode with a hole pattern centered with respect to the plasma source. Such plasma applicator provides an efficient energy transfer to the plasma. The plasma applicator is preferably manufactured using a technology for producing electrical circuits. The electrode and a coil of the ferromagnetic inductively coupled plasma source are metal track portions formed on an insulating substrate. For example, the plasma applicator is manufactured using printed circuit board technology.
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