Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound
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United States of America Patent
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Jul 26, 2011
Grant Date -
Apr 22, 2010
app pub date -
Nov 16, 2006
filing date -
Nov 16, 2005
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Abstract
are the same or different alkyl groups having 1 to 3 carbons, and n is an integer of 2 or 3. The aluminum films may be thick or thin and may be aluminum films or may be mixed metal films with aluminum metal. Both CVD and ALD methods may be employed.
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