Methods of providing uniform gas delivery to a reactor
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United States of America Patent
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Jul 19, 2011
Grant Date -
Dec 31, 2009
app pub date -
Sep 3, 2009
filing date -
Apr 5, 2006
priority date (Note) -
Expired
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Abstract
A method of introducing gasses through a gas distribution system into a reactor involves flowing the gasses through at least two distinct gas source orifice arrays displaced from one another along an axis defined by a gas flow direction from the gas source orifice arrays towards a work-piece. During different time intervals, a purge gas and different reactive precursors are flowed into the reactor from different ones of the gas source orifice arrays. One of the precursors may be associated with a soft saturating atomic layer deposition half reaction and another of the precursors associated with a strongly saturating atomic layer deposition half reaction. An upper one of the gas source orifice arrays may be a relatively planar gas orifice array.
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